This inventor holds 2 USPTO granted patents. Top assignee: Snu Precision Co., Ltd.. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Young-Min Hwang: Innovator in Thickness Measurement Technology
Introduction
Young-Min Hwang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of thickness measurement technology, holding a total of 2 patents. His innovative approaches have paved the way for advancements in various applications.
Latest Patents
Hwang's latest patents include a "Method for Measuring Thickness" and an "Apparatus for Measuring Thickness." The method patent discloses a technique for measuring the thickness of a subjecting layer attached to a base layer using an interferometer. This involves obtaining a correlation equation of phase differences related to varying thicknesses of sample layers, acquiring interference signals, and determining the thickness of the subjecting layer through a correlation equation. The apparatus patent describes a thickness measurement device that includes a beam splitter, lens parts, an interference light detector, and a spectroscopic detector, all designed to accurately measure thickness by analyzing interference signals.
Career Highlights
Young-Min Hwang is currently employed at SNU Precision Co., Ltd., where he continues to develop innovative measurement technologies. His work has been instrumental in enhancing the precision and reliability of thickness measurements in various industrial applications.
Collaborations
Hwang collaborates with notable colleagues, including Heui-Jae Pahk and Woo-Jung Ahn, contributing to a dynamic research environment that fosters innovation and technological advancement.
Conclusion
Young-Min Hwang's contributions to thickness measurement technology exemplify his dedication to innovation and excellence in engineering. His patents reflect a commitment to advancing measurement techniques that benefit various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile