Bubaleub, South Korea

Young Hwa Mun


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Innovations by Young Hwa Mun in Semiconductor Technology

Introduction: Young Hwa Mun, an accomplished inventor located in Bubaleub, South Korea, has made notable contributions to the field of semiconductor devices. With a keen understanding of material science and engineering, Mun has innovated methods that enhance the performance and reliability of semiconductor technologies.

Latest Patents: Young Hwa Mun holds a patent for a groundbreaking invention titled "Method for forming a metallic barrier layer in semiconductor device." This invention pertains to a method for creating a titanium nitride-oxygen (TiNO) metallic barrier layer that effectively serves as a diffusion barrier. The process involves forming a TiN film using sputtering equipment with argon (Ar) and nitrogen (N₂) gas, following it with the implantation of N₂O gas on the TiN film's surface, and finally annealing in a nitrogen atmosphere to diffuse oxygen ions. This innovative approach results in a uniform TiNO film that plays a critical role in preventing the diffusion of silicon atoms between metal layers within semiconductor devices.

Career Highlights: Young Hwa Mun is currently employed at Hyundai Electronics Industries Co. Ltd., where he utilizes his expertise to advance semiconductor technologies. His work not only demonstrates technical prowess but also contributes to the overall growth of the semiconductor industry.

Collaborations: Throughout his career, Mun has collaborated with notable colleagues, including Hyun Jin Jang and Woo Bong Lee. These partnerships foster an environment of innovation and creativity, allowing for a shared goal of pushing boundaries in semiconductor research and development.

Conclusion: Young Hwa Mun stands out as a leading inventor in the realm of semiconductor technology, exemplifying how innovation can lead to improved devices and processes. His patented method for forming a metallic barrier layer underscores the importance of innovative thinking in advancing technological frontiers. As he continues to work at Hyundai Electronics Industries Co. Ltd., his contributions are expected to leave a lasting impact on the industry.

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