Hwaseong-si, South Korea

Young-chul Hwang


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: Young-chul Hwang: Innovator in Integrated Circuit Technology

Introduction

Young-chul Hwang is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of integrated circuit technology, particularly in the development of advanced transistor structures. With a total of 2 patents to his name, Hwang continues to push the boundaries of innovation in the semiconductor industry.

Latest Patents

Hwang's latest patents focus on methods of manufacturing fin field effect transistors (FinFETs) with reduced gate thicknesses overlying deep trenches. One of his notable inventions describes an integrated circuit (IC) device that includes a substrate with a device region featuring a fin-type active region and a deep trench region. The gate line in this invention extends in a direction that intersects the fin-type active region, while an inter-device isolation layer fills the deep trench region. The design includes a first gate portion that covers the fin-type active region and has a flat upper surface at a first level, along with a second gate portion that covers the inter-device isolation layer and is integrally connected to the first gate portion.

Career Highlights

Hwang is currently employed at Samsung Electronics Co., Ltd., where he has been instrumental in advancing the company's semiconductor technologies. His work has contributed to the development of cutting-edge integrated circuits that are essential for modern electronic devices.

Collaborations

Throughout his career, Hwang has collaborated with notable colleagues, including Yong-hee Park and Young-Seok Song. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Young-chul Hwang is a key figure in the field of integrated circuit technology, with a focus on enhancing the performance of FinFETs. His contributions to Samsung Electronics Co., Ltd. and his innovative patents reflect his commitment to advancing semiconductor technology.

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