Suwon, South Korea

Young Choul Shin

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Intek Co., Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Young Choul Shin. Retrieved from https://idiyas.com/inventor/young-choul-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Young Choul Shin: Innovator in Ink Cartridge Refill Technology

Introduction

Young Choul Shin is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of inkjet printing technology. His innovative approach to ink cartridge refilling has garnered attention in the industry.

Latest Patents

Young Choul Shin holds a patent for an "Ink cartridge refill system for inkjet printers and method of refilling ink cartridges using the same." This patent describes a sophisticated refill system that utilizes a vacuum pump to supply ink from an ink tank into a cylinder. The system also includes an air compression pump that generates the necessary force to inject ink into the cartridge. The design allows for the regulation of inner pressure within the cartridge and ensures the complete removal of waste ink during the refill process.

Career Highlights

Throughout his career, Young Choul Shin has worked with several companies, including Intek Co., Ltd. and Inktek Co., Ltd. His experience in these organizations has contributed to his expertise in ink technology and innovation.

Collaborations

Young Choul Shin has collaborated with notable colleagues, including Jeong Guck Lee and In Ha Kim. Their combined efforts have further advanced the development of ink cartridge technologies.

Conclusion

Young Choul Shin's contributions to ink cartridge refill technology demonstrate his innovative spirit and commitment to improving printing solutions. His patent reflects a significant advancement in the field, showcasing his expertise and dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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