Seoul, South Korea

Young Ah Woo

This inventor holds 1 USPTO granted patent. Top assignee: Spectron Tech Co., Ltd.. Active years: 2003.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Young Ah Woo: Innovator in Skin Moisture Measurement Technology

Introduction

Young Ah Woo is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of skin moisture measurement through his innovative patent. His work focuses on utilizing advanced technology to improve the accuracy and reliability of skin moisture assessments.

Latest Patents

Young Ah Woo holds a patent for a "Method and apparatus for measuring skin moisture by using near infrared reflectance spectroscopy." This invention involves measuring a set of reference moisture values from various skin samples using conventional devices. A standard calibration equation is then derived from the measured reflectance spectra and stored in memory. The patented method allows for the measurement of skin moisture in a consistent and stable manner, regardless of external temperature or humidity variations.

Career Highlights

Young Ah Woo is currently employed at Spectron Tech Co., Ltd., where he continues to develop and refine his innovative technologies. His work has garnered attention for its practical applications in skincare and dermatology, making significant strides in the industry.

Collaborations

Some of his coworkers include Hyo Jin Kim and Myung Yun Kim, who contribute to the collaborative environment at Spectron Tech Co., Ltd. Their teamwork enhances the development of cutting-edge technologies in skin moisture measurement.

Conclusion

Young Ah Woo's contributions to the field of skin moisture measurement through his innovative patent demonstrate his commitment to advancing technology in skincare. His work not only improves measurement accuracy but also addresses the challenges posed by environmental factors.

Profile summary based on public USPTO records.
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