Chungcheongnam-do, South Korea

Youn Gun Bong

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youn Gun Bong. Retrieved from https://idiyas.com/inventor/youn-gun-bong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Youn Gun Bong: Innovator in Substrate Treatment Technology

Introduction

Youn Gun Bong is a notable inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Youn Gun Bong holds a patent for a "Substrate Treating Apparatus and Substrate Treating Method." This invention provides a comprehensive solution for heating and plasma treatment of substrates within a single device. The apparatus includes a treatment container for accommodating the substrate, a support member to hold the substrate in place, a plasma providing unit with an electrode for generating plasma, and a microwave introducing unit that connects to a microwave generating unit to introduce microwaves into the treatment container. He has 1 patent to his name.

Career Highlights

Youn Gun Bong is currently associated with Semes Co., Ltd., where he continues to innovate and develop advanced technologies in substrate treatment. His work has been instrumental in improving the efficiency and effectiveness of substrate processing in various applications.

Conclusion

Youn Gun Bong's contributions to substrate treatment technology exemplify the impact of innovative thinking in the field of engineering. His patented apparatus represents a significant advancement in the industry, showcasing his dedication to enhancing substrate processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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