Niigata, Japan

Youji Ogawa

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Ceramics Co., Ltd.. Active years: 1998.


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Youji Ogawa in Silicon Wafer Manufacturing

Introduction: Youji Ogawa, a notable inventor from Niigata, Japan, has made significant advancements in the field of silicon wafer manufacturing. His inventive work focuses primarily on eliminating the need for final mirror-polishing processes, leading to enhanced efficiency and product quality.

Latest Patents: Youji Ogawa holds one patent titled "Silicon wafer manufacturing method eliminating final mirror-polishing." This method involves a sophisticated process of mirror-polishing silicon wafers to achieve precise surface roughness values. The surfaces can reach a roughness of Ra between 0.70-1.00 nm, Rq of 0.80-1.10 nm, or Rt of 4.50-7.00 nm before undergoing heat treatment at a temperature of no less than 1,200 degrees Celsius in a hydrogen gas atmosphere for a duration of 30 minutes to 4 hours. Additionally, it accounts for alternative surface roughness targets in smaller areas, ensuring high-quality outcomes in various applications.

Career Highlights: Currently, Youji Ogawa is associated with Toshiba Ceramics Co., Ltd., where he continues to innovate and develop advanced manufacturing processes. His expertise and focus contribute to the company's reputation for excellence in semiconductor and ceramics technologies.

Collaborations: Throughout his career, Youji Ogawa has collaborated with esteemed colleagues such as Hiroshi Shirai and Jun Yoshikawa. Their combined expertise has undoubtedly enhanced the depth and impact of their research and development endeavors in silicon wafer technology.

Conclusion: Youji Ogawa’s innovative approach to silicon wafer manufacturing exemplifies how targeted advancements can drastically improve technological processes. His contributions through patented methods not only reflect the spirit of innovation but also push the boundaries of efficiency in semiconductor manufacturing. By continuously collaborating with knowledgeable peers, Ogawa is helping to shape the future of the industry.

Profile summary based on public USPTO records.
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