Youde Shen

Title: Youde Shen - Innovator in Polymer Pen Lithography

Introduction

Youde Shen is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of lithography, particularly through his innovative patent related to polymer pen lithography. His work focuses on enhancing the precision and efficiency of lithographic techniques.

Latest Patents

Youde Shen holds a patent for a "Composite tip array for polymer pen lithography." This patent describes a method of preparing a tip for lithography, which includes forming a mold with at least one recess. The process involves disposing a first polymer in the recess to create an apex of the tip, curing the first polymer, and then adding a second polymer to form the base of the tip. Notably, the Young's Modulus of the second polymer is lower than that of the first polymer. The resulting tip structure for lithography consists of a substrate and a layered structure that includes a tip with an apex made of the first polymer and a base made of the second polymer. The first polymer is designed to be less resiliently deformable than the second polymer, enhancing the performance of the lithographic process.

Career Highlights

Youde Shen is affiliated with The Hong Kong Polytechnic University, where he contributes to research and development in the field of materials science and engineering. His work has garnered attention for its practical applications in advanced manufacturing and technology.

Collaborations

Youde Shen has collaborated with esteemed colleagues such as Zijian Zheng and Xuechang Zhou. Their combined expertise has furthered research initiatives and innovations in their respective fields.

Conclusion

Youde Shen's contributions to polymer pen lithography exemplify the intersection of innovation and practical application in technology. His patent and ongoing work at The Hong Kong Polytechnic University highlight his role as a key figure in advancing lithographic techniques.