The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2015
Filed:
May. 09, 2012
Zijian Zheng, Hong Kong, CN;
Youde Shen, Hong Kong, CN;
Xuechang Zhou, Hong Kong, CN;
Xie Zhuang, Hong Kong, CN;
Zijian Zheng, Hong Kong, CN;
Youde Shen, Hong Kong, CN;
Xuechang Zhou, Hong Kong, CN;
Xie Zhuang, Hong Kong, CN;
THE HONG KONG POLYTECHNIC UNIVERSITY, Kowloon, Hong Kong, CN;
Abstract
A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.