Seoul, South Korea

You-Seung Rim

USPTO Granted Patents = 2 

Average Co-Inventor Count = 7.9

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2015

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2 patents (USPTO):Explore Patents

Title: You-Seung Rim: Innovator in Semiconductor Technology

Introduction

You-Seung Rim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of innovative methods for forming semiconductor thin films. With a total of 2 patents, his work has garnered attention in both academic and industrial circles.

Latest Patents

One of his latest patents is titled "Method of formation of tin oxide semiconductor thin film doped with antimony." This patent provides a composition for forming tin oxide semiconductors, which includes a tin precursor compound, an antimony precursor compound, and a solvent. The method involves preparing a composition, disposing it on a substrate, and performing heat treatment on the coated substrate. Another notable patent is "Composition for manufacturing oxide semiconductor and method for manufacturing thin-film transistor substrate using the same." This patent outlines a method for manufacturing a thin film transistor substrate by coating a composition that includes a metal oxalate and a solvent, followed by annealing and patterning the thin film to create a semiconductor pattern.

Career Highlights

Throughout his career, You-Seung Rim has worked with leading organizations, including Samsung Display Co., Ltd. and Yonsei University. His experience in these institutions has allowed him to collaborate with other experts in the field and contribute to groundbreaking research in semiconductor technology.

Collaborations

Some of his notable coworkers include Hyun-Jae Kim and Hyun-Soo Lim. Their collaborative efforts have further advanced the research and development of semiconductor technologies.

Conclusion

You-Seung Rim's innovative work in semiconductor technology, particularly through his patents, showcases his expertise and commitment to advancing the field. His contributions are likely to have a lasting impact on the industry and academia alike.

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