Taipei, Taiwan

You-Neng Cheng

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2002.


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: You-Neng Cheng: Innovator in Dielectric Etch Processes

Introduction

You-Neng Cheng is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly in dielectric etch methods. His innovative approaches have led to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

You-Neng Cheng holds a patent for an "Integrated post-etch treatment for a dielectric etch process." This patent addresses the challenges associated with byproducts formed on the sidewalls of contact vias during the dielectric etch process. The method he developed efficiently removes these byproducts and reduces polymer accumulation on process chamber surfaces. The post-etch treatment method involves exposing a semiconductor structure to a plasma generated from a source gas comprising oxygen, a nitrogen-comprising gas, and a reactive gas comprising hydrogen, carbon, and fluorine. This innovative approach is performed within the same processing chamber as the dielectric etch process, streamlining the overall procedure.

Career Highlights

You-Neng Cheng is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work focuses on improving etching processes, which are critical for the fabrication of integrated circuits. Cheng's expertise in this area has positioned him as a valuable asset to his team and the industry at large.

Collaborations

Throughout his career, You-Neng Cheng has collaborated with notable colleagues, including Hui Ou-Yang and Chih-Ping Yang. These collaborations have fostered a productive environment for innovation and have contributed to the advancement of semiconductor technologies.

Conclusion

You-Neng Cheng's contributions to the field of semiconductor processing, particularly through his patented methods, demonstrate his commitment to innovation. His work continues to influence the efficiency of dielectric etch processes, making a significant impact on the semiconductor industry.

Profile summary based on public USPTO records.
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