Taichung, Taiwan

You-Lin Shih

This inventor holds 1 USPTO granted patent. Top assignee: Cpc Corporation, Taiwan. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: You-Lin Shih. Retrieved from https://idiyas.com/inventor/you-lin-shih-dfbl3aku

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: You-Lin Shih: Innovator in Phosphinated Oligomers

Introduction

You-Lin Shih is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of chemistry, particularly in the development of phosphinated oligomers. His innovative work has led to the creation of a unique preparation method and cured product that showcases his expertise.

Latest Patents

You-Lin Shih holds a patent for a phosphinated (2,6-dimethylphenyl ether) oligomer, which includes a detailed preparation method and the resulting cured product. This oligomer features a complex structure represented by a specific formula, where various components can be independently selected. His patent is a testament to his innovative approach in the field of materials science.

Career Highlights

You-Lin Shih is currently associated with Cpc Corporation, Taiwan, where he continues to advance his research and development efforts. His work has not only contributed to his company but has also added value to the broader scientific community.

Collaborations

Throughout his career, You-Lin Shih has collaborated with esteemed colleagues such as Sheng-De Li and Ching-Hsuan Lin. These partnerships have fostered a collaborative environment that enhances innovation and research outcomes.

Conclusion

You-Lin Shih's contributions to the field of phosphinated oligomers highlight his role as a leading inventor in Taiwan. His innovative patent and ongoing work at Cpc Corporation demonstrate his commitment to advancing materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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