Suwon, South Korea

You Ho Kim

This inventor holds 1 USPTO granted patent. Top assignee: Emw Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: You Ho Kim. Retrieved from https://idiyas.com/inventor/you-ho-kim-3a1ay8ih

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: You Ho Kim - Innovator in RFID Technology

Introduction

You Ho Kim is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of RFID technology, particularly in developing systems that enhance the efficiency of RFID readers.

Latest Patents

One of his key patents is titled "System and method for allowing multiple RFID reader devices to read RFID tags without collision." This innovative patent addresses the challenge of multiple RFID readers operating simultaneously without interference. The system groups RFID readers that are spaced apart to avoid collisions and classifies them into sub-groups based on their read times. This method allows for simultaneous operation of different sub-groups, thereby reducing read times and improving overall efficiency.

Career Highlights

You Ho Kim has been instrumental in advancing RFID technology through his work at Emw Co., Ltd. His expertise in this area has led to the development of solutions that are crucial for various applications in industries that rely on RFID systems.

Collaborations

He has collaborated with notable colleagues, including Byung Hoon Ryou and Won Mo Sung, to further enhance the capabilities of RFID technology.

Conclusion

You Ho Kim's contributions to RFID technology exemplify his innovative spirit and dedication to improving system efficiencies. His work continues to influence the field and pave the way for future advancements in RFID applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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