Ulsan, South Korea

You Han Kim

This inventor holds 1 USPTO granted patent. Top assignee: Ce & Chem Inc.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: You Han Kim. Retrieved from https://idiyas.com/inventor/you-han-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: You Han Kim: Innovator in Plasma Display Technology

Introduction

You Han Kim is a notable inventor based in Ulsan, South Korea. He has made significant contributions to the field of plasma display technology, particularly through his innovative patent that enhances the efficiency and cost-effectiveness of plasma display panels (PDP).

Latest Patents

You Han Kim holds a patent for a "Protective layer material for PDP and method of manufacturing the same." This invention involves an MgO protective layer formed on a front substrate of a plasma display panel. The method of manufacturing this protective layer utilizes an MgO pellet that is doped with a first doping material of BeO and/or CaO, along with a second material selected from ScO, SbO, ErO, MoO, and AlO. This innovative approach significantly improves the discharge efficiency of the PDP and reduces discharge delay time, making it suitable for signal can PDPs. Additionally, it lowers manufacturing costs by minimizing the number of electronic components required.

Career Highlights

You Han Kim is associated with Ce & Chem Inc., where he continues to work on advancements in display technology. His expertise and innovative mindset have positioned him as a key player in the industry.

Collaborations

He collaborates with talented coworkers, including Jeong Seok Kim and Seok Jung, who contribute to the development of cutting-edge technologies in their field.

Conclusion

You Han Kim's contributions to plasma display technology through his innovative patent demonstrate his commitment to enhancing efficiency and reducing costs in manufacturing. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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