Okayama, Japan

Yosuke Ota

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Gas Chemical Company, Inc.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yosuke Ota. Retrieved from https://idiyas.com/inventor/yosuke-ota-0uvknsgv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Yosuke Ota: Innovator in Urethane Resin Technology

Introduction

Yosuke Ota is a notable inventor based in Okayama, Japan. He has made significant contributions to the field of materials science, particularly in the development of urethane resins. His innovative work focuses on enhancing adhesive strength in challenging environmental conditions.

Latest Patents

Yosuke Ota holds a patent for a unique urethane resin. This resin is characterized by its excellent adhesive strength, which remains high even after exposure to high temperatures and humidity. The invention involves a urethane resin obtained by reacting a glycol-modified aromatic hydrocarbon-formaldehyde resin with a polyisocyanate that has two or more free isocyanate groups in a molecule.

Career Highlights

Ota is currently employed at Mitsubishi Gas Chemical Company, Inc., where he continues to advance his research and development efforts. His work has positioned him as a key player in the field of adhesive technologies.

Collaborations

Yosuke Ota collaborates with Tomohiro Hariu, contributing to various projects that enhance the capabilities of urethane resins.

Conclusion

Yosuke Ota's innovative contributions to urethane resin technology demonstrate his commitment to advancing materials science. His work not only improves adhesive strength but also addresses the challenges posed by environmental factors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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