Nisshin, Japan

Yosuke Maegawa

This inventor holds 1 USPTO granted patent. Top assignees: Denso Corporation, Mirise Technologies Corporation, Toyota Jidosha Kabushiki Kaisha. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yosuke Maegawa. Retrieved from https://idiyas.com/inventor/yosuke-maegawa-6lu40oua

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Yosuke Maegawa: Innovator in Semiconductor Manufacturing

Introduction

Yosuke Maegawa is a notable inventor based in Nisshin, Japan. He has made significant contributions to the field of semiconductor manufacturing, showcasing his expertise through innovative methods and techniques.

Latest Patents

Maegawa holds a patent for a "Method for manufacturing semiconductor device." This method involves several key steps, including preparing a semiconductor substrate, arranging a mask on the substrate's surface, and forming trenches through a two-step etching process. The process culminates in the arrangement of a gate insulating film and a gate electrode within the trenches, resulting in the formation of trench gate structures. He has 1 patent to his name.

Career Highlights

Throughout his career, Yosuke Maegawa has worked with prominent companies such as Denso Corporation and Toyota Jidosha Kabushiki Kaisha. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor technology.

Collaborations

Maegawa has collaborated with various professionals in his field, including his coworker Yohei Iwahashi. These collaborations have fostered innovation and the exchange of ideas, further enhancing the development of semiconductor manufacturing techniques.

Conclusion

Yosuke Maegawa's contributions to semiconductor manufacturing highlight his innovative spirit and dedication to advancing technology. His patent and career achievements reflect his significant role in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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