Nagano, Japan

Yosuke Ehara

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Minebea Mitsumi Inc.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yosuke Ehara. Retrieved from https://idiyas.com/inventor/yosuke-ehara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Yosuke Ehara: Innovator in Strain Gauge Technology

Introduction

Yosuke Ehara is a notable inventor based in Nagano, Japan. He has made significant contributions to the field of sensor technology, particularly with his innovative work on strain gauges. His expertise and creativity have led to advancements that simplify manufacturing processes in load sensors.

Latest Patents

Yosuke Ehara holds a patent for a strain gauge, load sensor, and method for manufacturing a strain gauge. The strain gauge includes a substrate formed from a resin material, a resistor provided on a surface of the substrate, and a fusion layer on the opposite surface. This fusion layer is a thermoplastic polyimide layer. The design aims to create a strain gauge that is as thin as possible, thereby simplifying the manufacturing process of load sensors.

Career Highlights

Ehara is currently employed at Minebea Mitsumi Inc., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the efficiency and effectiveness of load sensors used in various applications.

Collaborations

Yosuke Ehara has collaborated with notable colleagues such as Dohaku Inamori and Tadahiko Karaki. Their combined expertise has contributed to the advancement of sensor technology and the successful development of innovative products.

Conclusion

Yosuke Ehara's contributions to strain gauge technology exemplify his commitment to innovation and excellence. His work not only advances the field but also paves the way for future developments in sensor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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