Yosimasa Takii

Title: Yosimasa Takii: Innovator in Sputtering Technology

Introduction

Yosimasa Takii is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of sputtering technology, which is essential for various applications in thin film deposition.

Latest Patents

Takii holds a patent for a sputtering apparatus and sputtering method. This innovative apparatus features a vacuum chamber designed to arrange a target material and a substrate facing each other. It includes a DC power supply that can be electrically connected to the target material and a pulsing unit that pulses electric current flowing in the target material. The apparatus generates plasma in the vacuum chamber to form a thin film on the substrate. Additionally, it incorporates an ammeter to measure the electric current flowing in the pulsing unit, a power supply controller for feedback control, and a pulse controller that indicates a pulse cycle shifted from the control cycle of the DC power supply.

Career Highlights

Yosimasa Takii is currently employed at Panasonic Intellectual Property Management Co., Ltd. His work at this esteemed company has allowed him to focus on advancing sputtering technology and its applications.

Collaborations

Throughout his career, Takii has collaborated with notable colleagues, including Masaaki Tanabe and Daisuke Suetsugu. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Yosimasa Takii is a distinguished inventor whose work in sputtering technology has made a significant impact. His patent for a sputtering apparatus showcases his innovative approach to thin film deposition.