Fuji, Japan

Yoshiyuki Suenaga

This inventor holds 1 USPTO granted patent. Top assignee: Asahi Kasei Kogyo Kabushiki Kaisha. Active years: 1981.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshiyuki Suenaga. Retrieved from https://idiyas.com/inventor/yoshiyuki-suenaga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 1981

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Yoshiyuki Suenaga

Introduction

Yoshiyuki Suenaga is a notable inventor based in Fuji, Japan. He has made significant contributions to the field of materials science, particularly through his innovative work on photosensitive elastomeric compositions. His inventions have the potential to impact various industries, especially in printing technologies.

Latest Patents

Yoshiyuki Suenaga holds a patent for a novel photosensitive elastomeric composition. This composition comprises a thermoplastic elastomer, an ethylenically unsaturated compound, a photopolymerization initiator, and an N-substituted maleimide compound. The invention is recognized for its excellent photosensitivity, making it particularly useful for the manufacture of flexographic printing elements.

Career Highlights

Suenaga is associated with Asahi Kasei Kogyo Kabushiki Kaisha, a leading company in the chemical industry. His work at the company has allowed him to focus on developing advanced materials that meet the evolving needs of modern manufacturing processes.

Collaborations

One of his notable collaborators is Shohei Nakamura. Together, they have worked on various projects that leverage their expertise in materials science and engineering.

Conclusion

Yoshiyuki Suenaga's contributions to the field of elastomeric compositions highlight his innovative spirit and dedication to advancing technology. His work continues to influence the manufacturing landscape, particularly in printing applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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