Company Filing History:
Years Active: 2003-2010
Title: Innovations of Yoshiyuki Seike
Introduction
Yoshiyuki Seike is a notable inventor based in Owariasahi, Japan. He has made significant contributions to the field of cleaning apparatus technology, holding a total of 3 patents. His work focuses on improving the efficiency and effectiveness of cleaning processes, particularly in the semiconductor industry.
Latest Patents
Seike's latest patents include a nozzle device and a cleaning apparatus equipped with the nozzle device. The nozzle device features a substantially cylindrical nozzle body and a cup member arranged within the cylinder. This design allows for the jetted fluid droplets to be controlled to a smaller size than conventional systems, ensuring effective cleaning of a single wafer without contamination or pattern destruction. Additionally, his resist stripping method and apparatus efficiently strips resist layers from wafers using a high-pressure jetted stripping solution, combining physical and chemical effects for optimal results.
Career Highlights
Yoshiyuki Seike is associated with Asahi Sunac Corporation, where he continues to innovate and develop advanced cleaning technologies. His work has been instrumental in enhancing the cleaning processes used in semiconductor manufacturing, contributing to higher quality and efficiency in production.
Collaborations
Seike has collaborated with notable coworkers, including Masahiko Amari and Keiji Miyachi, to further advance the technologies in which he specializes.
Conclusion
Yoshiyuki Seike's contributions to cleaning apparatus technology demonstrate his commitment to innovation and efficiency in the semiconductor industry. His patents reflect a deep understanding of the challenges faced in this field and provide effective solutions to enhance cleaning processes.