The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2003
Filed:
May. 21, 1999
Applicant:
Inventors:
Masahiko Amari, Owariasahi, JP;
Yoshiyuki Seike, Owariasahi, JP;
Assignee:
Asahi Sunac Corporation, Owariasahi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 ;
U.S. Cl.
CPC ...
B08B 3/02 ;
Abstract
A method and an apparatus capable of stripping resist efficiently in a short amount of time. A stripping solution under high pressure is jetted from a nozzle to a rotating wafer. The resist layer on the wafer is applied with the jetted stripping solution, and the resist layer can be efficiently stripped in a short amount of time by the multiplied effect by the physical effect caused by the impact of the jetted stripping solution and the chemical effect of the stripping solution.