Yoshiyuki Oota

Title: Innovations of Yoshiyuki Oota in Plasma Processing Technology

Introduction

Yoshiyuki Oota is a notable inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on optimizing plasma processing apparatuses to enhance the uniformity of wafer processing.

Latest Patents

Oota's latest patents include a method and apparatus for plasma processing. This invention discloses a plasma processing apparatus designed to minimize the non-uniformity of potential distribution around the wafer circumference. The apparatus features a focus ring made of a dielectric material, along with a conductor or semiconductor that has RF applied to it. The surface voltage of the focus ring is set to be not less than a minimum voltage to prevent reaction products from depositing on it. The design optimizes the surface height, voltage, material, and structure of the focus ring to ensure that the height of the ion sheath formed on its surface is either equal to or has a height difference within an appropriate tolerance range compared to the ion sheath formed on the wafer surface.

Career Highlights

Yoshiyuki Oota is currently employed at Hitachi High-Technologies Corporation, where he continues to innovate in the field of plasma processing. His work has been instrumental in advancing the technology used in semiconductor manufacturing.

Collaborations

Oota has collaborated with notable colleagues, including Ryoji Nishio and Tadamitsu Kanekiyo, contributing to the development of advanced plasma processing techniques.

Conclusion

Yoshiyuki Oota's contributions to plasma processing technology reflect his dedication to innovation and excellence in the field. His patents demonstrate a commitment to improving the efficiency and effectiveness of semiconductor manufacturing processes.