Yoshiyuki Honma

Title: Innovations of Yoshiyuki Honma

Introduction

Yoshiyuki Honma is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on advanced methods and apparatuses that enhance the production of organic semiconductor devices.

Latest Patents

Honma's latest patents include a method for producing a frame-equipped vapor deposition mask, a stretching apparatus, and an apparatus for producing organic semiconductor devices. The method for producing a frame-equipped vapor deposition mask involves preparing a vapor deposition mask that includes a metal mask with a slit and a resin mask with an opening corresponding to a pattern to be produced by vapor deposition. The process entails stacking the metal and resin masks, retaining part of the vapor deposition mask with a retainer, and stretching it outward. The mask is then fixed in a stretched state to a frame with a through hole. Adjustments can be made during stretching to ensure precision in the production process.

Career Highlights

Yoshiyuki Honma has built a successful career at Dai Nippon Printing Co., Ltd., where he has been instrumental in developing innovative technologies. His expertise in vapor deposition techniques has positioned him as a key figure in the semiconductor industry.

Collaborations

Honma has collaborated with notable colleagues, including Katsunari Obata and Toshihiko Takeda. Their combined efforts have contributed to advancements in semiconductor manufacturing processes.

Conclusion

Yoshiyuki Honma's contributions to the field of semiconductor technology through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and pave the way for future advancements.