Wakayama, Japan

Yoshiteru Ishikawa

This inventor holds 1 USPTO granted patent. Top assignee: Duplo Seiko Corporation. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshiteru Ishikawa. Retrieved from https://idiyas.com/inventor/yoshiteru-ishikawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Yoshiteru Ishikawa

Introduction

Yoshiteru Ishikawa is a notable inventor based in Wakayama, Japan. He has made significant contributions to the field of paper processing technology. His innovative approach has led to the development of a unique method for drying wet paper, which has implications for waste paper recycling.

Latest Patents

Ishikawa holds a patent for a "Method of drying wet paper and waste paper recycling apparatus." This invention involves pressing wet paper against a heating surface while utilizing a conveying surface to transport the wet paper. The design includes a pressure regulating gap that is smaller than the thickness of the wet paper but larger than that of the recycled paper produced. This innovative method enhances the efficiency of drying and recycling processes.

Career Highlights

Yoshiteru Ishikawa is associated with Duplo Seiko Corporation, where he has been instrumental in advancing paper processing technologies. His work has not only improved operational efficiencies but has also contributed to sustainable practices in the industry.

Collaborations

Ishikawa has collaborated with notable colleagues, including Ryuichi Oota and Yoshihisa Higashimoto. Their combined expertise has fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Yoshiteru Ishikawa's contributions to the field of paper processing through his innovative patent demonstrate his commitment to advancing technology in sustainable ways. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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