Mishima, Japan

Yoshitaka Murofushi

This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshitaka Murofushi. Retrieved from https://idiyas.com/inventor/yoshitaka-murofushi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:

goldMedal1 out of 834,513 
Other
 patents

Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Innovations of Yoshitaka Murofushi

Introduction

Yoshitaka Murofushi is a notable inventor based in Mishima, Japan. He has made significant contributions to the field of semiconductor technology, particularly in temperature control methods for semiconductor substrates. His innovative approach aims to enhance the reliability and efficiency of semiconductor manufacturing processes.

Latest Patents

Murofushi holds a patent for a "Method and apparatus for controlling rise and fall of temperature in semiconductor substrates." This invention addresses the challenge of preventing cracks in semiconductor substrates during oxidation, diffusion, or chemical vapor deposition processes. The method involves measuring temperatures at various points within the heated reactor and determining the temperature rise/fall characteristics. A temperature control program is then automatically selected to adapt to these characteristics, ensuring optimal conditions for the semiconductor substrates. Additionally, the invention includes a susceptor designed to minimize contamination from metal impurities during thin film formation.

Career Highlights

Throughout his career, Murofushi has focused on advancing semiconductor technology. His work has contributed to improved manufacturing processes, which are crucial for the production of reliable electronic components. His innovative methods have garnered attention in the industry, showcasing his expertise and commitment to technological advancement.

Collaborations

Murofushi has collaborated with notable colleagues such as Shyuji Tobashi and Tadashi Ohashi. These partnerships have facilitated the exchange of ideas and expertise, further enhancing the impact of their collective work in the semiconductor field.

Conclusion

Yoshitaka Murofushi's contributions to semiconductor technology through his innovative patent demonstrate his dedication to improving manufacturing processes. His work continues to influence the industry, paving the way for advancements in semiconductor applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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