Odawara, Japan

Yoshiro Kitsukawa

This inventor holds 1 USPTO granted patent. Top assignee: Fuji Photo Film Company, Limited. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshiro Kitsukawa. Retrieved from https://idiyas.com/inventor/yoshiro-kitsukawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Yoshiro Kitsukawa: Innovator in Magnetic Recording Media

Introduction

Yoshiro Kitsukawa is a notable inventor based in Odawara, Japan. He has made significant contributions to the field of magnetic recording media, showcasing his innovative spirit and technical expertise.

Latest Patents

Kitsukawa holds a patent for a magnetic recording medium that features a specific width relationship between the magnetic coat and primer coat. This invention addresses issues related to scrapes occurring in the selvage portion of a web and prevents blocking trouble during heat treatment in post-processing. The patent describes a method of producing a magnetic recording medium that includes a release coat on the back surface of the web. This design ensures that the overcoatedly primed portions do not stick to the back surface during the coating process and heat treatment, thereby enhancing the overall quality and reliability of the magnetic recording medium.

Career Highlights

Yoshiro Kitsukawa is associated with Fuji Photo Film Company, Limited, where he has applied his innovative ideas to advance the company's technology in magnetic recording. His work has contributed to the development of more efficient and reliable recording media.

Collaborations

Kitsukawa has collaborated with Shinsuke Takahashi, further enhancing the innovative efforts within their field.

Conclusion

Yoshiro Kitsukawa's contributions to magnetic recording media exemplify the impact of innovation in technology. His patent not only addresses existing challenges but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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