Ebina, Japan

Yoshio Okaya

This inventor holds 1 USPTO granted patent. Top assignees: Pola Chemical Industries, Inc., Takeda Chemical Industries, Inc.. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshio Okaya. Retrieved from https://idiyas.com/inventor/yoshio-okaya

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: The Innovations of Yoshio Okaya

Introduction

Yoshio Okaya is a notable inventor based in Ebina, Japan. He is recognized for his contributions to the field of dermatology through his innovative patent related to skin care. His work has had a significant impact on the development of external skin preparations.

Latest Patents

Yoshio Okaya holds a patent for an external skin preparation that features manganese-containing superoxide dismutase activity. This aqueous preparation includes both manganese-containing superoxide dismutase and a physiologically acceptable water-soluble manganese salt. The formulation is designed to combat skin roughness effectively.

Career Highlights

Throughout his career, Yoshio Okaya has worked with prominent companies in the chemical industry. He has been associated with Pola Chemical Industries, Inc. and Takeda Chemical Industries, Inc., where he contributed to various research and development projects.

Collaborations

Yoshio Okaya has collaborated with several professionals in his field, including Katsumi Tomoda and Taihei Hamazaki. These collaborations have furthered his research and innovations in skin care formulations.

Conclusion

Yoshio Okaya's work in developing effective skin care solutions showcases his dedication to innovation in dermatology. His patent and collaborations highlight his significant contributions to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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