Location History:
- Hachioji, JP (1980 - 1981)
- Urawa, JP (1981 - 1984)
Company Filing History:
6 out of 42,517 
2 out of 522 Years Active: 1980-1984
Title: Yoshio Hatano: Innovator in Pattern Formation and Imaging Technology
Introduction
Yoshio Hatano is a prominent inventor based in Hachioji, Japan. He has made significant contributions to the fields of pattern formation and imaging technology. With a total of 6 patents to his name, Hatano's work has had a lasting impact on various technological advancements.
Latest Patents
One of his latest patents is a pattern formation method utilizing deep UV radiation. This method involves exposing a photosensitive composition that includes a bisazide compound to deep UV rays, allowing for the formation of fine patterns. Another notable patent is for a color solid-state imager and the method of making it. This invention comprises a semiconductor body with laminated filter layers and a transparent, organic high molecular material that is sensitive to radiation. The method simplifies the production of color solid-state imagers by utilizing radiation-sensitive materials for intermediate layers.
Career Highlights
Throughout his career, Yoshio Hatano has worked with esteemed companies such as Hitachi, Ltd. and Nippon Telegraph and Telephone Public Corporation. His experience in these organizations has contributed to his expertise in developing innovative technologies.
Collaborations
Hatano has collaborated with notable coworkers, including Saburo Nonogaki and Takahiro Kohashi. Their combined efforts have led to advancements in the technologies they have worked on together.
Conclusion
Yoshio Hatano's contributions to pattern formation and imaging technology highlight his innovative spirit and dedication to advancing these fields. His patents and collaborations reflect a commitment to excellence in technology development.