Hitachi, Ltd.

Nippon Telegraph and Telephone Public Corporation

Yoshio Hatano

Saburo Nonogaki

Takahiro Kohashi

Michiaki Hashimoto

Toshio Nakano

Akira Sasano

Eiichi Maruyama

Shinkichi Horigome

Haruo Matsumaru

Takao Iwayanagi

Tadao Kaneko

Shungo Sugawara

Disclosed is a pattern formation method comprising exposing a photosensitive composition comprising a bisazide compound represented by the following general formula: ##STR1## wherein A stands for an atom or atomic group selected from O, S, CH.sub.2, CH.sub.2 CH.sub.2, SO.sub.2 and S.sub.2, X stands for an atom or atomic group selected from H and N.sub.3, and when X is H, Z is a group of N.sub.3 and when X is N.sub.3, Z is an atom of H or Cl, and a polymeric compound to deep UV rays, to form fine patterns.

Pattern formation method utilizing deep UV radiation and bisazide

A color solid-state imager comprises a semiconductor body over which are successively laminated a predetermined number of filter layers of any desired shape having predetermined spectral characteristics and, laminated on the filter layers, a predetermined number of layers composed of a transparent, organic high molecular material which is sensitive to radiation, the semiconductor substrate having at least a detector portion composed of an array of a plurality of optical detector elements. The method of making color solid-state imagers can be simplified by at least using the radiation-sensitive high molecular material for the intermediate layers or protection layers which are used for forming a laminate construction of color-decomposing filters. Further, in mounting the color-decomposing filters on the semiconductor substrate, it is particularly preferred to form beforehand a film of an organic high molecular material.

Color solid-state imager and method of making the same

A method for forming radiation images by using a polymeric compound having in the molecule a plurality of epoxy groups and a plurality of bromine atoms. The polymeric compound has a high radiation sensitivity and high contrast.

Photopolymer imaging using epoxy and bromine containing ethylenically

This invention relates to light sensitive photoresist materials which are used in the photo-engraving process or in the production of the phosphor screens of color picture tubes. The light sensitive photoresist materials of this invention are novel, water-soluble azide materials.

Light sensitive photoresist materials

The present invention relates to a novel light sensitive photoresist composition which is used for the photo-engraving process or for production of phosphor screen of color picture tubes. The light sensitive photoresist composition of the present invention comprises a novel water-soluble aromatic azide compound and a photo-crosslinkable water-soluble polymer.

Method of pattern forming in a photosensitive composition having a

A radiation-sensitive composition comprising a radiation-sensitive polymer which has in its molecule a plurality of epoxy groups and a plurality of bromine atoms, and at least one stabilizer which is selected from the group consisting of compounds having stable free radicals, polymerization inhibitors, ketone-amine reaction products, and phenol derivatives. Even when the composition is preserved for a long term, the characteristics do not change.

Growing community of inventors

Hachioji, Japan

Yoshio Hatano