Urawa, Japan

Yoshio Aoki

This inventor holds 1 USPTO granted patent. Top assignee: Canon Kabushiki Kaisha. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshio Aoki. Retrieved from https://idiyas.com/inventor/yoshio-aoki-s7hkrohy

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: The Innovations of Yoshio Aoki

Introduction

Yoshio Aoki is a notable inventor based in Urawa, Japan. He has made significant contributions to the field of liquid crystal technology. His work has led to the development of innovative materials that have applications in various industries.

Latest Patents

Yoshio Aoki holds a patent for a mesomorphic compound and a liquid crystal composition containing the same. This invention is represented by a specific chemical formula that includes various alkyl groups and other components. The patent highlights the unique properties of the mesomorphic compound, which can be utilized in advanced liquid crystal applications.

Career Highlights

Aoki is associated with Canon Kabushiki Kaisha, a leading company in imaging and optical products. His role at Canon has allowed him to work on cutting-edge technologies that enhance the functionality of liquid crystals. His expertise in this area has contributed to the company's reputation for innovation.

Collaborations

Yoshio Aoki has collaborated with esteemed colleagues such as Yasumasa Tashiro and Akira Sakaigawa. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Yoshio Aoki's contributions to liquid crystal technology and his innovative patent demonstrate his significant impact in the field. His work continues to influence advancements in materials science and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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