Yoshimitu Shimane

Title: Innovations of Yoshimitu Shimane

Introduction

Yoshimitu Shimane is a notable inventor based in Hachioji, Japan. He has made significant contributions to the field of technology, particularly in the area of substrate holding apparatus and mask alignment methods.

Latest Patents

Shimane holds a patent for a substrate holding apparatus, mask alignment method, and vacuum processing apparatus using long taper pins and short taper pins for alignment. This innovative mask alignment method involves a first engaging portion formed in one of the substrate holder and the mask, which has two protruding portions. The second engaging portion is formed in the other one of the substrate holder and the mask, featuring at least one protruding portion. The method includes engaging the protruding portions of the first engaging portion with first groove portions to align the mask with respect to the substrate holder in a first direction. Following this, the protruding portion of the second engaging portion engages with the second groove portion to align the mask in a direction perpendicular to the first direction.

Career Highlights

Yoshimitu Shimane is currently employed at Canon Anelva Corporation, where he continues to innovate and develop advanced technologies. His work has been instrumental in enhancing the efficiency and accuracy of mask alignment processes in various applications.

Collaborations

Shimane collaborates with Nobuo Yamaguchi, a fellow innovator, to further advance their research and development efforts in the field.

Conclusion

Yoshimitu Shimane's contributions to technology through his innovative patents and collaborations highlight his importance in the field of substrate holding apparatus and mask alignment methods. His work continues to influence advancements in this area.