Nagoya, Japan

Yoshiko Kobayashi


Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Nagoya, JP (1993)
  • Yokohama, JP (1993)

Company Filing History:


Years Active: 1993

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2 patents (USPTO):Explore Patents

Title: The Innovations of Yoshiko Kobayashi

Introduction

Yoshiko Kobayashi is a prominent inventor based in Nagoya, Japan. She has made significant contributions to the field of lithographic printing technology. With a total of 2 patents, her work has had a lasting impact on the industry.

Latest Patents

Kobayashi's latest patents include a lithographic printing plate utilizing an aluminum substrate. This innovation discloses a photosensitive composition that comprises positive photosensitive planographic printing plates containing specific components. Additionally, she has developed a positive photosensitive planographic printing plate that features a photosensitive layer comprising a specific o-naphthoquinonediazidosulfonic ester and a resin with particular structural units. This layer may also include a novolak resin and/or an organic acid, showcasing her expertise in advanced materials.

Career Highlights

Throughout her career, Yoshiko Kobayashi has worked with notable companies such as Konica Corporation and Mitsubishi Kasei Corporation. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking innovations in printing technology.

Collaborations

Kobayashi has collaborated with esteemed colleagues, including Kiyoshi Goto and Hideyuki Nakai. These partnerships have fostered a creative environment that has led to the development of her innovative patents.

Conclusion

Yoshiko Kobayashi's contributions to lithographic printing technology exemplify her dedication and expertise in the field. Her patents and collaborations reflect her significant role as an inventor in advancing printing solutions.

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