Nishi-Okitama, Japan

Yoshihisa Wada

This inventor holds 1 USPTO granted patent. Top assignee: Toshiba Ceramics Co., Ltd.. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihisa Wada. Retrieved from https://idiyas.com/inventor/yoshihisa-wada-vj840vp1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: The Innovations of Yoshihisa Wada

Introduction

Yoshihisa Wada is a notable inventor based in Nishi-Okitama, Japan. He has made significant contributions to the field of materials science, particularly in the development of silicon single crystal technologies. His work has implications for various industries, including electronics and semiconductor manufacturing.

Latest Patents

Wada holds a patent for a Silicon Single Crystal Pull-Up Apparatus. This innovative apparatus includes a crucible designed to contain molten silicon material, an annular heater that surrounds the crucible for effective heating, and a series of plate-like members made from heat insulation material. These members are arranged to form a cylinder with wave-like circumferential side walls, enhancing the efficiency of the silicon pulling process.

Career Highlights

Yoshihisa Wada has been associated with Toshiba Ceramics Co., Ltd., where he has applied his expertise in materials science to advance the company's technological capabilities. His work has been instrumental in improving the quality and efficiency of silicon crystal production.

Collaborations

Wada has collaborated with esteemed colleagues such as Shuitsu Matsuo and Masayuki Saito. These partnerships have fostered innovation and have contributed to the successful development of new technologies in the field.

Conclusion

Yoshihisa Wada's contributions to the field of silicon single crystal technology exemplify the importance of innovation in advancing industrial processes. His patent and collaborative efforts highlight the significant impact of dedicated inventors in shaping the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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