Yoshihiro Ueoka

Title: Innovations of Yoshihiro Ueoka

Introduction

Yoshihiro Ueoka is a notable inventor based in Ayase, Japan. He has made significant contributions to the field of materials science, particularly in the development of multilayer film structures. His innovative work has led to the filing of a patent that showcases his expertise and creativity.

Latest Patents

Yoshihiro Ueoka holds a patent for a multilayer film structure and the method for producing the same. This invention provides a multilayer film structure that exhibits high crystallinity and planarity. The structure includes an Si (111) substrate, a first thin film made of a nitride material and/or aluminum, and a second thin film formed of a nitride material. An amorphous layer with a thickness of 0 nm or more but less than 1.0 nm is present on the Si (111) substrate. Additionally, the full width at half maximum (FWHM) of a rocking curve of the (0002) plane at the surface of this multilayer film structure is 1.50° or less. This patent highlights his innovative approach to material design.

Career Highlights

Throughout his career, Yoshihiro Ueoka has worked with prominent organizations, including Tosoh Corporation and the National Institute for Materials Science. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in materials science.

Collaborations

Yoshihiro Ueoka has collaborated with talented individuals such as Yuya Tsuchida and Yuya Suemoto. These collaborations have fostered a creative environment that has led to advancements in their respective fields.

Conclusion

Yoshihiro Ueoka's contributions to the field of materials science through his innovative patent and collaborations with esteemed colleagues underscore his importance as an inventor. His work continues to influence advancements in multilayer film structures and materials technology.