Yawara, Japan

Yoshihiro Shono


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2000

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of Yoshihiro Shono

Introduction

Yoshihiro Shono is a notable inventor based in Yawara, Japan. He has made significant contributions to the field of engineering, particularly in the development of process pumps. His innovative designs focus on efficiency and functionality, which have garnered attention in the industry.

Latest Patents

Yoshihiro Shono holds a patent for a diaphragm-type double-acting process pump. This invention features a reduced number of members to be assembled to a center plate and minimizes the number of hermetically sealed portions. The design includes a space defined by the center plate, along with a side cover and a side body, which are positioned on both sides of the center plate. This space is divided by two diaphragms into left and right driving chambers, as well as left and right pump chambers. The pump chambers communicate with a suction opening and a discharge opening through check valves, enhancing the pump's operational efficiency.

Career Highlights

Yoshihiro Shono is associated with SMC Corporation, a leading company in the field of automation and control systems. His work at SMC Corporation has allowed him to apply his innovative ideas in practical applications, contributing to the company's reputation for excellence in engineering solutions.

Collaborations

Throughout his career, Yoshihiro Shono has collaborated with talented individuals such as Hiroyuki Miki and Tsuyoshi Kagami. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Yoshihiro Shono's contributions to the field of process pumps exemplify his innovative spirit and dedication to engineering. His patent reflects a commitment to improving efficiency and functionality in industrial applications. His work continues to inspire future advancements in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…