The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2000

Filed:

Aug. 12, 1997
Applicant:
Inventors:

Hiroyuki Miki, Yawara, JP;

Tsuyoshi Kagami, Yawara, JP;

Yoshihiro Shono, Yawara, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04B / ;
U.S. Cl.
CPC ...
417395 ; 417454 ; 92100 ;
Abstract

A diaphragm-type double-acting process pump has a reduced number of members to be assembled to a center plate and also a reduced number of hermetically sealed portions. A space defined by the center plate, together with a side cover and a side body, which are provided on both sides, respectively, of the center plate, is divided by two diaphragms into left and right driving chambers inside the diaphragms and left and right pump chambers outside the diaphragms. The left and right pump chambers are communicated with a suction opening through check valves and also communicated with a discharge opening through check valves. The center plate is fitted in a recess formed in the side body, and the side cover is brought into contact with both the side body and the center plate to clamp the center plate by the side cover and the side body. Passages for communication between the suction opening and the left and right pump chambers and passages for communication between the discharge opening and the pump chambers are provided in the side body and the side cover. A controller is provided in the center plate.


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