Yokohama, Japan

Yoshihiro Maeda

This inventor holds 2 USPTO granted patents. Top assignees: Konishiroku Photo Industry Co., Ltd., Mitsubishi Chemical Industries Limited. Active years: 1988-1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihiro Maeda. Retrieved from https://idiyas.com/inventor/yoshihiro-maeda-6dclrw83

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1988-1990

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2 patents (USPTO):Explore Patents

Title: Yoshihiro Maeda: Innovator in Photosensitive Compositions

Introduction

Yoshihiro Maeda is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of photosensitive compositions, holding a total of 2 patents. His work has had a considerable impact on lithographic printing technologies.

Latest Patents

Maeda's latest patents include a "Photosensitive diazo composition" and a "Photosensitive diazo lithographic." The photosensitive composition is principally comprised of a photosensitive diazo resin and a lipophilic high molecular compound. This innovative composition further contains a metal complex dye soluble in an organic solvent. Additionally, he has disclosed a photosensitive lithographic printing plate that employs such a photosensitive composition.

Career Highlights

Throughout his career, Yoshihiro Maeda has worked with prominent companies, including Mitsubishi Chemical Industries Limited and Konishiroku Photo Industry Co., Ltd. His experience in these organizations has allowed him to develop and refine his expertise in photosensitive technologies.

Collaborations

Maeda has collaborated with notable coworkers such as Kiyoshi Goto and Norihito Suzuki. Their combined efforts have contributed to advancements in the field of photosensitive compositions.

Conclusion

Yoshihiro Maeda's innovative work in photosensitive compositions has established him as a key figure in the industry. His patents and collaborations reflect his commitment to advancing lithographic technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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