This inventor holds 1 USPTO granted patent. Top assignees: Ishikawa Seisakusho, Ltd., Other. Active years: 1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1998
Title: The Innovations of Yoshihiro Iwasa
Introduction
Yoshihiro Iwasa is a notable inventor based in Ishikawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of fullerene compounds. His innovative work has led to advancements in various applications, showcasing his expertise and creativity.
Latest Patents
Yoshihiro Iwasa holds a patent for a "Fullerene compound, manufacturing method, and use." This patent describes a method where fullerene compounds, such as C60, are dissolved in solvents like toluene at a concentration of 1.times.10-3 mol/L or more. When the solution is coagulated, fullerene associated bodies are formed. After re-dissolution, these associated bodies can be excited by a laser beam, resulting in cluster compounds of fullerene with specific numbers of monomers, such as 23 and 53. The clusters are stable and can be separated from the solution, highlighting the practical applications of his research.
Career Highlights
Throughout his career, Yoshihiro Iwasa has worked with Ishikawa Seisakusho, Ltd., where he has contributed to various projects and innovations. His work has been instrumental in advancing the understanding and application of fullerene compounds in different industries.
Collaborations
Yoshihiro Iwasa has collaborated with notable individuals in his field, including Johnson Ahn and Tadaoki Mitani. These collaborations have further enriched his research and development efforts, leading to innovative solutions and advancements.
Conclusion
Yoshihiro Iwasa's contributions to the field of fullerene compounds demonstrate his innovative spirit and dedication to scientific advancement. His patent and career achievements reflect his significant impact on materials science, paving the way for future developments in this area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile