Yoshihiro Ikeda

Title: Yoshihiro Ikeda: Innovator in Semiconductor Technology

Introduction

Yoshihiro Ikeda is a prominent inventor based in Ohme, Japan, known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, he has made remarkable advancements in the field of integrated circuit devices.

Latest Patents

Ikeda's latest patents include a semiconductor integrated circuit device and a process for fabricating the same. This innovative process involves forming MISFETs over the principal surface in active regions of a substrate, surrounded by inactive regions formed of an element separating insulating film and channel stopper regions. The process includes several steps, such as forming a first mask using a non-oxidizable mask and an etching mask, and etching the principal surface of the inactive regions. Another notable patent involves a semiconductor integrated circuit device that features a first wiring strip exposed through a connecting hole, a transition-metal film in the connecting hole, and an aluminum wiring strip above it.

Career Highlights

Throughout his career, Yoshihiro Ikeda has worked with notable companies, including Hitachi, Ltd. and Hitachi VLSI Engineering Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Ikeda has collaborated with esteemed colleagues such as Jun Sugiura and Osamu Tsuchiya, further enhancing his contributions to the field.

Conclusion

Yoshihiro Ikeda's work in semiconductor technology has led to significant advancements and innovations. His patents reflect his dedication to improving integrated circuit devices, making him a key figure in the industry.