Nikaho, Japan

Yoshihiro Enda

This inventor holds 1 USPTO granted patent. Top assignee: Tdk Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshihiro Enda. Retrieved from https://idiyas.com/inventor/yoshihiro-enda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Yoshihiro Enda

Introduction: Yoshihiro Enda, a prominent inventor based in Nikaho, Japan, has made significant contributions to the field of magnet production. His expertise and dedication to innovation are reflected in his patent and career at TDK Corporation.

Latest Patents: Yoshihiro Enda holds a patent for a "Method for producing sintered magnet." This innovative process involves several key steps: wet-pulverizing a magnetic powder in the presence of a surface-active agent, followed by drying the wet-pulverized magnetic powder to obtain a magnetic powder to which the surface-active agent is adhered. This method enhances the properties and manufacturing processes of sintered magnets.

Career Highlights: Enda is affiliated with TDK Corporation, a leading company in electronic components. With a focus on developing advanced technologies, his role at TDK demonstrates his commitment to driving innovation within the industry.

Collaborations: Throughout his career, Yoshihiro has worked alongside notable colleagues, including Masashi Gotoh and Yoshihiko Minachi. These collaborations highlight the collective effort in advancing technology and fostering a dynamic work environment at TDK Corporation.

Conclusion: Yoshihiro Enda's journey as an inventor showcases his impactful contributions to the field of magnet production. His patent and collaboration with esteemed colleagues reflect his dedication to innovation, making him a significant figure in the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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