This inventor holds 1 USPTO granted patent. Top assignee: Panasonic Liquid Crystal Display Co., Ltd.. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014
Title: Yoshihiro Daito: Photoresist Pattern Inspection
Introduction
Yoshihiro Daito is an inventor associated with Ichihara, Japan, and Panasonic Liquid Crystal Display Co., Ltd. His patent work addresses photoresist patterning and inspection in display manufacturing. He is credited with 1 patent.
Latest Patents
Daito’s listed patent, “Inspection Method for Patterning of Photoresist,” describes forming a photoresist layer by moving a nozzle while dispensing liquid through a slit. Photolithography transfers a latent image to the layer and develops it to create a resist pattern on a film.
The method includes a dummy latent image that runs continuously parallel to the slit’s length, producing a corresponding dummy resist. Inspection checks whether the dummy resist has a cut along that direction, providing a way to identify a patterning defect.
Career Highlights
Daito’s patent reflects work on process inspection for photoresist patterning. The described approach uses a continuous dummy feature as an indicator for detecting interruptions in the resist pattern.
Collaborations
Daito’s listed coworkers include Ryuuta Watanabe and Yoshitaka Imabayashi. The patent information connects his work with Panasonic Liquid Crystal Display Co., Ltd.
Conclusion
Yoshihiro Daito’s patent focuses on detecting cuts in photoresist patterns through inspection of a continuous dummy resist, highlighting a practical approach to manufacturing quality control.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile