This inventor holds 1 USPTO granted patent. Top assignee: Sekisui Chemical Co., Ltd.. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Innovations of Yoshihiko Eguchi
Introduction
Yoshihiko Eguchi is a notable inventor based in Shinnanyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of chlorinated vinyl chloride-based resins. His work has led to advancements in the properties and applications of these materials.
Latest Patents
Yoshihiko Eguchi holds a patent for a chlorinated vinyl chloride-based resin and molded articles. This invention provides a vinyl chloride resin with a high void ratio and micropores within the particles, allowing for superior filling and distribution of various compounding additives. The patent also includes methods for producing chlorinated vinyl chloride resins that exhibit excellent gelation properties and heat resistance. Additionally, his innovations encompass highly heat-resistant chlorinated vinyl chloride resin pipes and joints, as well as plates and moldings that demonstrate exceptional heat resistance, shock resistance, and chemical resistance.
Career Highlights
Yoshihiko Eguchi is associated with Sekisui Chemical Co., Ltd., where he has contributed to the development of advanced materials. His work has been instrumental in enhancing the performance characteristics of chlorinated vinyl chloride resins, making them suitable for various industrial applications.
Collaborations
Yoshihiko has collaborated with notable colleagues, including Yuhki Gotoh and Kenichi Asahina. Their combined expertise has fostered innovation and development in the field of materials science.
Conclusion
Yoshihiko Eguchi's contributions to the field of chlorinated vinyl chloride-based resins have paved the way for advancements in material properties and applications. His innovative work continues to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile