Yoshihide Kamiyama

Title: Innovations of Yoshihide Kamiyama

Introduction

Yoshihide Kamiyama is a notable inventor based in Tokuyama, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced substrates. With a total of 2 patents to his name, Kamiyama's work is recognized for its innovative approach and practical applications.

Latest Patents

Kamiyama's latest patents include a substrate and a production method for sintered aluminum nitride. The first patent describes a sintered aluminum nitride substrate that features a via hole and an internal electrically conductive layer. This substrate is characterized by high thermal conductivity and strong adhesion between the substrate and the conductive layer. Specifically, the thermal conductivity of the aluminum nitride sintering product at 25°C is 190 W/mK or more, with an adhesion strength of 5.0 kg/mm or more. The second patent outlines a process for producing sintered aluminum nitride with satisfactorily densified via holes. This method ensures that the aluminum nitride molding is free from cracking and has an excellent appearance after firing.

Career Highlights

Yoshihide Kamiyama is currently employed at Tokuyama Corporation, where he continues to innovate in the field of materials. His work has been instrumental in advancing the technology surrounding aluminum nitride substrates, which are crucial for various electronic applications.

Collaborations

Kamiyama collaborates with talented coworkers, including Reo Yamamoto and Yuichiro Minabe. Their combined expertise contributes to the success of their projects and the advancement of their research.

Conclusion

Yoshihide Kamiyama's contributions to the field of materials science, particularly through his patents on sintered aluminum nitride substrates, highlight his innovative spirit and dedication to advancing technology. His work at Tokuyama Corporation continues to influence the industry positively.