Yoshiharu Ozaki

Title: The Innovations of Yoshiharu Ozaki

Introduction

Yoshiharu Ozaki is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of technology, particularly in the development of capacitors and photomask inspection methods. With a total of 3 patents to his name, Ozaki's work reflects a commitment to advancing electronic components and manufacturing processes.

Latest Patents

Ozaki's latest patents include a novel capacitor design and a unique method for inspecting photomasks. The capacitor patent describes a structure that consists of a first metal interconnection layer, a dielectric film, and a second metal interconnection layer. The dielectric film is formed on the first metal interconnection layer, while the second metal interconnection layer is placed on the dielectric film. This dielectric film is created using bias-ECR plasma CVD technology. His second patent focuses on an elliptical light measuring method for photomask inspection. This method inspects a photomask based on the differences in the polarized state of elliptical light produced by the superposition of two linearly polarized light beams.

Career Highlights

Throughout his career, Yoshiharu Ozaki has worked with prominent organizations, including Nippon Telegraph and Telephone Public Corporation and Nippon Telegraph and Telephone Corporation. His experience in these companies has allowed him to refine his skills and contribute to significant technological advancements.

Collaborations

Ozaki has collaborated with esteemed colleagues such as Katsuyuki Machida and Kazuo Imai. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Yoshiharu Ozaki's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in electronic components and manufacturing processes.