The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1997
Filed:
May. 29, 1996
Applicant:
Inventor:
Yoshiharu Ozaki, Kanagawa, JP;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J / ;
U.S. Cl.
CPC ...
356364 ; 356366 ; 356367 ; 250225 ;
Abstract
In a photomask inspecting method, a photomask is inspected on the basis of the difference between the polarized state of elliptical light produced upon superposition of two linearly polarized light beams having orthogonal polarization directions and passing through two different optical paths and the polarized state of elliptical light produced when two linearly polarized light beams are superposed on each other after a target portion of a photomask is set in the optical path of one of the linearly polarized light beams. A photomask inspecting apparatus is also disclosed.