Yokkaichi Mie, Japan

Yoshiharu Okada

This inventor holds 1 USPTO granted patent. Top assignee: Kioxia Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshiharu Okada. Retrieved from https://idiyas.com/inventor/yoshiharu-okada-bubg1duk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Yoshiharu Okada: Semiconductor Device Innovation

Introduction

Yoshiharu Okada is an inventor based in Yokkaichi, Mie, Japan, and is associated with Kioxia Corporation. His listed patent concerns semiconductor device design and manufacturing.

Latest Patents

Okada is credited with 1 patent: “Semiconductor Device and Method for Manufacturing Semiconductor Device.” The invention describes a semiconductor device with a substrate, a spacer, and a first member. The spacer has surfaces arranged so that at least part of one surface forms an angle of less than 90 degrees with the opposite surface. The first member partly overlaps the spacer when viewed from the substrate toward it, while remaining out of contact with the spacer.

Career Highlights

The available information identifies Okada as an inventor associated with Kioxia Corporation and highlights his work on semiconductor device structures and manufacturing methods.

Collaborations

His listed company affiliation is Kioxia Corporation. The provided information does not specify collaborators or co-inventors for the patent.

Conclusion

Yoshiharu Okada’s listed patent reflects a contribution to semiconductor device engineering through a design that defines the relationship between a substrate, spacer, and overlapping member.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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