This inventor holds 1 USPTO granted patent. Top assignee: Rion Company Ltd.. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Innovations by Yoshifumi Bandou
Introduction
Yoshifumi Bandou is a notable inventor based in Kitakyushu, Japan. He has made significant contributions to the field of polishing solutions through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of polishing processes.
Latest Patents
Yoshifumi Bandou holds a patent for an "Apparatus for producing polishing solution and apparatus for feeding the same." This invention involves a system designed to create a polishing solution composed of pure water and abrasive grains. The apparatus includes a preparation tank that mixes an abrasive grain-containing slurry with pure water to achieve a predetermined concentration. Additionally, it features a circulation device that maintains the polishing solution in a suspended state. This device incorporates a circulation conduit and a flow-controllable bypass conduit, which ensures a constant flow rate. A light-extinction type particle detector is also included to monitor the solution, detecting large abrasive grains and measuring their quantity.
Career Highlights
Yoshifumi Bandou has dedicated his career to advancing technologies related to polishing solutions. His innovative approach has led to the development of efficient systems that improve the quality of polishing processes. He is associated with Rion Company Ltd., where he continues to contribute to research and development in this field.
Collaborations
Yoshifumi Bandou has worked alongside talented colleagues, including Kaoru Kondo and Naoki Tsuda. Their collaborative efforts have furthered the advancements in polishing technology.
Conclusion
Yoshifumi Bandou's contributions to the field of polishing solutions exemplify the impact of innovation in industrial processes. His patent reflects a commitment to improving efficiency and quality in polishing applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
