Saijo, Japan

Yoshie Kanazawa

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fujibo Holdings, Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshie Kanazawa. Retrieved from https://idiyas.com/inventor/yoshie-kanazawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Innovations by Yoshie Kanazawa

Introduction

Yoshie Kanazawa is a notable inventor based in Saijo, Japan. She has made significant contributions to the field of polishing technology, particularly through her innovative methods and products. Her work is characterized by a focus on enhancing the efficiency and effectiveness of polishing processes.

Latest Patents

One of her key patents is for a polishing pad and method for producing the polishing pad. This invention provides a method for creating a finish polishing pad that allows for the formation of a stable film, enabling polishing with fewer scratches. The method involves dissolving a composition for forming a polyurethane resin film, removing insoluble components, and adding a poor solvent to create a mixture solution. This innovative approach results in a high-quality polyurethane resin film that improves polishing outcomes.

Career Highlights

Yoshie Kanazawa is currently associated with Fujibo Holdings, Inc., where she applies her expertise in material science and engineering. Her work at the company has been instrumental in advancing polishing technologies and enhancing product quality.

Collaborations

She collaborates with talented coworkers, including Teppei Tateno and Hirohito Miyasaka, contributing to a dynamic team environment that fosters innovation and creativity.

Conclusion

Yoshie Kanazawa's contributions to polishing technology through her innovative patent demonstrate her commitment to advancing the field. Her work not only enhances product quality but also sets a benchmark for future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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