Kanagawa, Japan

Yoshibumi Suzuki

This inventor holds 1 USPTO granted patent. Top assignee: Dupont Air Products Nanomaterials, LLC. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yoshibumi Suzuki. Retrieved from https://idiyas.com/inventor/yoshibumi-suzuki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Yoshibumi Suzuki: Innovator in Chemical-Mechanical Polishing

Introduction

Yoshibumi Suzuki is a notable inventor based in Kanagawa, Japan. He has made significant contributions to the field of chemical-mechanical polishing, particularly in the semiconductor industry. His innovative approach addresses critical challenges in substrate surface preparation.

Latest Patents

Yoshibumi Suzuki holds a patent for a polishing method designed to reduce dishing of tungsten on a dielectric. This invention relates to compositions and methods for chemical-mechanical polishing of substrate surfaces that feature tungsten and dielectric materials. The patented method ensures similar removal rates for both tungsten and dielectric materials, enhancing the efficiency of the polishing process. The compositions typically have a pH ranging from about 1.5 to about 3.5 and include periodic acid and colloidal silica. He has 1 patent to his name.

Career Highlights

Yoshibumi Suzuki is currently employed at DuPont Air Products Nanomaterials, LLC, where he continues to develop innovative solutions in material processing. His work has been instrumental in advancing the technology used in semiconductor manufacturing.

Collaborations

Yoshibumi collaborates with Haruki Nojo, contributing to the development of new methodologies and compositions in their field.

Conclusion

Yoshibumi Suzuki's contributions to chemical-mechanical polishing represent a significant advancement in semiconductor technology. His innovative methods and compositions are paving the way for more efficient manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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