Daejeon, South Korea

YooSeok Kim

This inventor holds 1 USPTO granted patent. Top assignee: Lg Chem, Ltd. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: YooSeok Kim. Retrieved from https://idiyas.com/inventor/yooseok-kim-q3vq6d8s

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2017

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovations of YooSeok Kim in Trichlorosilane Production

Introduction

YooSeok Kim is a notable inventor based in Daejeon, South Korea. He has made significant contributions to the field of chemical engineering, particularly in the production of trichlorosilane. His innovative methods have the potential to enhance industrial processes and improve efficiency.

Latest Patents

YooSeok Kim holds a patent for a method for producing trichlorosilane. The invention involves dispersing metal silicon particles in liquid silane-based compounds containing tetrachlorosilane. Additionally, it includes the optional reaction of the metal silicon particles with hydrogen chloride in the presence of hydrogen gas. This method represents a significant advancement in the production of trichlorosilane.

Career Highlights

YooSeok Kim is currently employed at LG Chem, Ltd., a leading chemical company. His work at LG Chem has allowed him to apply his innovative ideas in a practical setting, contributing to the company's reputation for excellence in chemical production.

Collaborations

YooSeok Kim has collaborated with notable colleagues, including JeongKyu Kim and JinHyoung Yoo. These collaborations have fostered a productive environment for innovation and development in their respective fields.

Conclusion

YooSeok Kim's contributions to the production of trichlorosilane exemplify the impact of innovative thinking in the chemical industry. His work not only advances technology but also enhances industrial practices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…